| Detailed information |
| Original study plan |
Master's programme Nanoscience and Technology 2012W |
| Objectives |
To provide profound knowledge about the most important methods for "top-down" fabrication of nanostructures, with particular focus on the processing technologies used for fabrication of semiconductor devices and microchips.
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| Subject |
"Top-down" Nanofabrication methods.
Topics: VLSI Technology, MOSFET transistors, CMOS structure, semiconductor wafers, lithography, pattern transfer, chemical and plasma etching, oxidation, thin film depositions, ion implatation, process integration and process flow.
|
| Criteria for evaluation |
Oral exam, dates by arrangement.
|
| Methods |
Lecture
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| Language |
German or English |
| Study material |
A detailed script of the course can be downloaded form KUSSS.
Additional literature and reference will be given during the lectures.
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| Changing subject? |
No |
| Further information |
Basic course for Master and PhD students interested in Nano- and Materials Science.
Complementary to the lecture, practical exersises can be enrolled that provide hands-on skills in nanofabrication (see course Practical Excersises Nanofabrication II).
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| Corresponding lecture |
(*)TPMPNVONAF2: VO Nanofabrikation II (3 ECTS) bzw.
TPMWNVOHLTE: VO Halbleitertechnologie (3 ECTS)
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