Inhalt

[ TPMPNVON2HT ] VL Nanofabrication II: Semiconductor Technology

Versionsauswahl
(*) Unfortunately this information is not available in english.
Workload Education level Study areas Responsible person Hours per week Coordinating university
3 ECTS M1 - Master's programme 1. year Physics Gunther Springholz 2 hpw Johannes Kepler University Linz
Detailed information
Original study plan Master's programme Nanoscience and Technology 2012W
Objectives To provide profound knowledge about the most important methods for "top-down" fabrication of nanostructures, with particular focus on the processing technologies used for fabrication of semiconductor devices and microchips.
Subject "Top-down" Nanofabrication methods.
Topics: VLSI Technology, MOSFET transistors, CMOS structure, semiconductor wafers, lithography, pattern transfer, chemical and plasma etching, oxidation, thin film depositions, ion implatation, process integration and process flow.
Criteria for evaluation Oral exam, dates by arrangement.
Methods Lecture
Language German or English
Study material A detailed script of the course can be downloaded form KUSSS. Additional literature and reference will be given during the lectures.
Changing subject? No
Further information Basic course for Master and PhD students interested in Nano- and Materials Science. Complementary to the lecture, practical exersises can be enrolled that provide hands-on skills in nanofabrication (see course Practical Excersises Nanofabrication II).
Corresponding lecture (*)TPMPNVONAF2: VO Nanofabrikation II (3 ECTS) bzw.
TPMWNVOHLTE: VO Halbleitertechnologie (3 ECTS)
On-site course
Maximum number of participants -
Assignment procedure Direct assignment