| Detailinformationen |
| Quellcurriculum |
Masterstudium Physics 2025W |
| Lernergebnisse |
Kompetenzen |
| (*)Upon successful completion of the course, students are able to apply experimental methods and instrumentation for semiconductor device fabrication. They can design, perform and optimize photolithography and pattering of semiconductor wafers. They are able to characterize the obtained structures, analyze their results and critically evaluate the findings.
This lab course is performed in the OIC clean room facility. It is methodologically complemented by the lecture Semiconductor Technology.
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| Fertigkeiten |
Kenntnisse |
(*)Upon completing the course, students will possess the following skills. They are able to
- design a process sequence for semiconductor patterning (k2/k3);
- perform lithography, thin film deposition and pattern transfer (k3);
- characterize and critically evaluate the results using microscopy techniques (k3-k5);
- analyze and summarize the obtained results in a laboratory report (k4/k5).
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(*)During the course, students will acquire practical knowledge in the following areas and concepts of semiconductor technology:
- experimental methods and instrumentation used for patterning of semiconductor nanostructures;
- state-of-the-art processes for lithography, thin film deposition and pattern transfer;
- characterization techniques to optimize nanostructure fabrication.
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| Beurteilungskriterien |
(*)experimental work, results and written protocol
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| Lehrmethoden |
(*)Students will perform various processing steps of semiconductor devices, using modern equipment under clean room conditions, and analyze and evaluate the results.
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| Abhaltungssprache |
Englisch |
| Literatur |
(*)Instructions and literature are available and can be downloaded from KUSSS.
script of the lecture Semiconductor Technology
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| Lehrinhalte wechselnd? |
Nein |
| Sonstige Informationen |
(*)The course is intended for Master and PhD students who would like to obtain practical experience and skills in the fabrication of micro- and nanostructures.
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| Äquivalenzen |
(*)TPMPNPRNAF2: PR Nanofabrikation II (1,5 ECTS)
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| Frühere Varianten |
Decken ebenfalls die Anforderungen des Curriculums ab (von - bis)
TPMPNPRN2HT: PR Nanofabrikation II: Halbleitertechnologie (2012S-2023S)
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