| (*)Upon completion of the course they will be able to
• understand principle and concepts related to gas kinetics (k1, k2)
• discriminate between and suitably select vacuum chambers, pumps and pressure sensors (k2, k3, k4)
• understand principles of thin film combinatorial libraries (k2, k3)
• understand the laser ablation mechanism (k2, k3, k4)
• understand principles of ion implantation and plasma treatments (k2, k3)
• understand principles of magnetron sputtering (k2, k3)
• apply principles of electrochemical thin film formation (k1, k2, k3)
• understand principles of chemical vapor phase deposition (k2, k4)
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(*)The course is divided into several parts with sections of theoretical background refreshing:
• Gas Kinetics - molecular impingement flux, ideal gas law, Knudsen law, mean free path, transport properties
• Surface interactions - nucleation and growth, thin film uniformity, cos law
• Vacuum chambers and pumps, Vacuum measurement - pumps for low, high and ultra-high vacuum, pressure gauges
• Thermal evaporation - Joule effect, co-evaporation, thin film combinatorial libraries
• Pulsed laser deposition - introduction to lasers, interaction with matter, ablation mechanism
• Energy beams and plasma - ion implantation, cathodic arc deposition, plasma
• Sputtering - RF sputtering, magnetron
• Electrochemical films - anodic oxide growth
• Chemical vapor deposition (CVD) - basics of CVD - gas transport, kinetic growth model
• Chemical vapor deposition (CVD) - types of CVD - PECVD, LECVD, ALD
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