| Detailinformationen |
| Quellcurriculum |
Masterstudium Physics 2023W |
| Ziele |
(*)To obtain detailed knowledge about the key methods for "top-down" fabrication of nanostructures. The particular focus is on the processing technologies used for fabrication of semiconductor devices and microchips.
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| Lehrinhalte |
(*)"Top-down" Nanofabrication methods.
Topics: VLSI Technology, MOSFET transistors, CMOS structure, crystal growth and wafer fabrication, doping and diffusion, lithography, pattern transfer, chemical and plasma etching, oxidation, thin film depositions, process integration and process flow.
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| Beurteilungskriterien |
(*)Oral exam, dates by arrangement.
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| Lehrmethoden |
(*)Lecture
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| Abhaltungssprache |
Deutsch oder Englisch |
| Literatur |
(*)A detailed script of the lecture can be downloaded form KUSSS.
Additional literature and reference will be given during the lectures.
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| Lehrinhalte wechselnd? |
Nein |
| Sonstige Informationen |
(*)Basic course for Master and PhD students interested in Nano- and Materials Science.
Accompanying to the lecture, practical exersises are offered to obtain hands-on skills in nanofabrication (see course Practical Excersises Nanofabrication II).
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| Äquivalenzen |
(*)TPMPNVONAF2: VO Nanofabrikation II (3 ECTS) bzw. TPMWNVOHLTE: VO Halbleitertechnologie (3 ECTS)
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| Frühere Varianten |
Decken ebenfalls die Anforderungen des Curriculums ab (von - bis)
TPMPNVON2HT: VO Nanofabrikation II: Halbleitertechnologie (2012S-2023S)
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