| Detailed information |
| Original study plan |
Master's programme Physics 2023W |
| Objectives |
To obtain detailed knowledge about the key methods for "top-down" fabrication of nanostructures. The particular focus is on the processing technologies used for fabrication of semiconductor devices and microchips.
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| Subject |
"Top-down" Nanofabrication methods.
Topics: VLSI Technology, MOSFET transistors, CMOS structure, crystal growth and wafer fabrication, doping and diffusion, lithography, pattern transfer, chemical and plasma etching, oxidation, thin film depositions, process integration and process flow.
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| Criteria for evaluation |
Oral exam, dates by arrangement.
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| Methods |
Lecture
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| Language |
German or English |
| Study material |
A detailed script of the lecture can be downloaded form KUSSS.
Additional literature and reference will be given during the lectures.
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| Changing subject? |
No |
| Further information |
Basic course for Master and PhD students interested in Nano- and Materials Science.
Accompanying to the lecture, practical exersises are offered to obtain hands-on skills in nanofabrication (see course Practical Excersises Nanofabrication II).
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| Corresponding lecture |
TPMPNVONAF2: VO Nanofabrikation II (3 ECTS) bzw. TPMWNVOHLTE: VO Halbleitertechnologie (3 ECTS)
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| Earlier variants |
They also cover the requirements of the curriculum (from - to)
TPMPNVON2HT: VO Nanofabrication II: Semiconductor Technology (2012S-2023S)
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