[ 491EMATATFV19 ] VL Advanced Thin Film Technologies

Workload Education level Study areas Responsible person Hours per week Coordinating university
1,5 ECTS M2 - Master's programme 2. year Chemistry Achim Walter Hassel 1 hpw Johannes Kepler University Linz
Detailed information
Original study plan Master's programme Chemistry and Chemical Technology (CCT) 2023W
Objectives The objectives are focused on providing advanced information regarding techniques for thin film deposition.
  1. Background knowledge review
  2. Surface interactions
  3. Vacuum
  4. Thermal evaporation
  5. Pulsed laser deposition
  6. Energy beams
  7. Sputtering
  8. Electrochemical films
  9. Basis of chemical vapour deposition (CVD)
  10. CVD types
  11. Chemical solution deposition
Criteria for evaluation The lecture finishes with a written, 1h examination. The evaluation contains 20 multiple choice questions.
Methods PowerPoint slides and board for calculation examples.
Language English
Study material The lecture itself would provide the minimum knowledge requested. Additional information may be found in various specialty books or instrument manufacturers
Changing subject? No
On-site course
Maximum number of participants -
Assignment procedure Direct assignment