[ TPMPNVON2HT ] VL Nanofabrication II: Semiconductor Technology

(*) Unfortunately this information is not available in english.
Workload Education level Study areas Responsible person Hours per week Coordinating university
3 ECTS M1 - Master's programme 1. year Physics Gunther Springholz 2 hpw Johannes Kepler University Linz
Detailed information
Original study plan Master's programme Nanoscience and Technology 2019W
Objectives To obtain detailed knowledge about the key methods for "top-down" fabrication of nanostructures. The particular focus is on the processing technologies used for fabrication of semiconductor devices and microchips.
Subject "Top-down" Nanofabrication methods.
Topics: VLSI Technology, MOSFET transistors, CMOS structure, crystal growth and wafer fabrication, doping and diffusion, lithography, pattern transfer, chemical and plasma etching, oxidation, thin film depositions, process integration and process flow.
Criteria for evaluation Oral exam, dates by arrangement.
Methods Lecture
Language German or English
Study material A detailed script of the lecture can be downloaded form KUSSS. Additional literature and reference will be given during the lectures.
Changing subject? No
Further information Basic course for Master and PhD students interested in Nano- and Materials Science. Accompanying to the lecture, practical exersises are offered to obtain hands-on skills in nanofabrication (see course Practical Excersises Nanofabrication II).
Corresponding lecture (*)TPMPNVONAF2: VO Nanofabrikation II (3 ECTS) bzw.
TPMWNVOHLTE: VO Halbleitertechnologie (3 ECTS)
On-site course
Maximum number of participants -
Assignment procedure Direct assignment